Manipulating Etch Selectivities in XeF2 Vapour Etching

This workbook contains the raw data for figures 2 - 8, some datasets were used to generate multiple figures. In this case, they are summarised in one datasheet. You can switch between them using the tabs at the bottom of the spread sheet.
The experimental method was previously presented at the ICMTS conference in 2020, more details are available in:
M. Rondé, A. J. Walton and J. G. Terry, "Test Structure for Measuring the Selectivity in Vapour Etch Processes," 2020 IEEE 33rd International Conference on Microelectronic Test Structures (ICMTS), Edinburgh, United Kingdom, 2020, pp. 1-5, doi: 10.1109/ICMTS48187.2020.9107934. It is recommended to read this publication in order to fully understand how the data presented here was generated

Rondé, Markus; Terry, Jonathan; Walton, Anthony. (2020). Manipulating Etch Selectivities in XeF2 Vapour Etching, [dataset]. The University of Edinburgh. School of Engineering. Institute of Integrated Micro and Nanosystems.https://doi.org/10.7488/ds/2929.