Original language | Undefined/Unknown |
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Pages (from-to) | 1462-1466 |
Number of pages | 5 |
Journal | Journal of Vacuum Science and Technology B |
Volume | B7 |
Publication status | Published - 1989 |
A comparison of damage in the dry etching of GaAs by conventional reactive ion etching and ECR generated plasma
Research output: Contribution to journal › Article › peer-review