An investigation of various post-RIE cleaning processes for dry etched InP-based HEMTs

H. C. Duran, Rebecca Cheung, W. Patrick, W. Bachtold, I. Pfund, G. Haehner

Research output: Contribution to journalArticlepeer-review

Original languageUndefined/Unknown
Pages (from-to)67-70
Number of pages4
JournalMicroelectronic Engineering
Volume35
Publication statusPublished - 1997

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