An investigation of various post-RIE cleaning processes for dry etched InP-based HEMTs

Research output: Contribution to journal › Article › peer-review

Original language	Undefined/Unknown
Pages (from-to)	67-70
Number of pages	4
Journal	Microelectronic Engineering
Volume	35
Publication status	Published - 1997

Cite this

@article{82b38975b090468da023bf72cf94b9c7,

title = "An investigation of various post-RIE cleaning processes for dry etched InP-based HEMTs",

author = "Duran, \{H. C.\} and Rebecca Cheung and W. Patrick and W. Bachtold and I. Pfund and G. Haehner",

year = "1997",

language = "Undefined/Unknown",

volume = "35",

pages = "67--70",

journal = "Microelectronic Engineering",

publisher = "Elsevier",

}