Application of Maxwell-Wagner polarization in delay lines

T. Prodromakis*, C. Papavassiliou, C. Toumazou

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract / Description of output

The propagation characteristics of metal-insulator-semiconductor (MIS) lines are controlled by the resistivity of the substrate, the operating frequency and the ratio of the semiconductor to insulator layer thicknesses. A strong interfacial polarisation, also known as the Maxwell-Wagner polarisation, is often responsible for the significant slow-down of the propagation velocity of MIS microstrip transmission lines. This phenomenon has been applied in the development of miniature delay lines exhibiting large electrical dimensions. In this paper we review most previously presented designs and we examine the effect of this polarization mechanism under various parameters. Finally, the presented micro-scale delay lines, exhibit comparable slowing factors with our predecessors at the cost of lower attenuation.

Original languageEnglish
Pages (from-to)17-24
Number of pages8
JournalMicroelectronics journal
Volume41
Issue number1
DOIs
Publication statusPublished - Jan 2010

Keywords / Materials (for Non-textual outputs)

  • Delay lines
  • High dielectric
  • Interfacial polarisation
  • Maxwell-Wagner
  • MIS lines
  • Slow-wave

Fingerprint

Dive into the research topics of 'Application of Maxwell-Wagner polarization in delay lines'. Together they form a unique fingerprint.

Cite this