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This paper describes the use of open-source electronic design automation tools, which have been developed and adapted for maskless lithography, to enable automation of the design, layout and measurement of parametric test structures. Two test structures are presented as case studies for characterisation of microelectronic and micro-electromechanical systems technologies using electrical and profilometry measurements respectively.
|Title of host publication||33rd IEEE International Conference on Microelectronic Test Structures (ICMTS 2020)|
|Publisher||Institute of Electrical and Electronics Engineers (IEEE)|
|Publication status||Published - 4 Jun 2020|