Batch encapsulation technique for CMOS based chemical sensors

T. Prodromakis*, P. Georgiou, T. G. Constandinou, K. Michelakis, C. Toumazou

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This paper presents a batch encapsulation technique for CMOS based chemical sensors. SU-8 photoresist is employed as the encapsulant while the sensing membrane of the sensor is directly exposed to the solution. This approach is based on standard photolithographic techniques and thus can be used for processing multiple dies containing chemical sensors in a single step.

Original languageEnglish
Title of host publication2008 IEEE-BIOCAS Biomedical Circuits and Systems Conference, BIOCAS 2008
Pages321-324
Number of pages4
DOIs
Publication statusPublished - 20 Feb 2009
Event2008 IEEE-BIOCAS Biomedical Circuits and Systems Conference, BIOCAS 2008 - Baltimore, MD, United States
Duration: 20 Nov 200822 Nov 2008

Publication series

Name2008 IEEE-BIOCAS Biomedical Circuits and Systems Conference, BIOCAS 2008

Conference

Conference2008 IEEE-BIOCAS Biomedical Circuits and Systems Conference, BIOCAS 2008
Country/TerritoryUnited States
CityBaltimore, MD
Period20/11/0822/11/08

Keywords / Materials (for Non-textual outputs)

  • Chemical sensor
  • CMOS
  • Encapsulation
  • ISFET
  • SU-8 photoresist

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