Characterisation of residual stress in dielectric films studied by automated wafer mapping

Ross Walker; E Sirotkin; G Schiavone; J.G. Terry; S Smith; A.R. Mount; M.P.Y Desmulliez; A J Walton

doi:10.1109/ICMTS.2014.6841475

Characterisation of residual stress in dielectric films studied by automated wafer mapping

Ross Walker, E Sirotkin, G Schiavone, J.G. Terry, S Smith, A.R. Mount, M.P.Y Desmulliez, A J Walton

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English
Title of host publication	Microelectronic Test Structures (ICMTS), 2014 International Conference on
Publisher	Institute of Electrical and Electronics Engineers (IEEE)
Pages	98-103
Number of pages	6
DOIs	https://doi.org/10.1109/ICMTS.2014.6841475
Publication status	Published - Mar 2014

Access to Document

10.1109/ICMTS.2014.6841475

1 Finished

SMART microsystems
Walton, A.
EPSRC
1/04/10 → 28/02/15
Project: Research

Cite this

Walker, R., Sirotkin, E., Schiavone, G., Terry, J. G., Smith, S., Mount, A. R., Desmulliez, M. P. Y., & Walton, A. J. (2014). Characterisation of residual stress in dielectric films studied by automated wafer mapping. In Microelectronic Test Structures (ICMTS), 2014 International Conference on (pp. 98-103). Institute of Electrical and Electronics Engineers (IEEE). https://doi.org/10.1109/ICMTS.2014.6841475

@inproceedings{14371b7d46864e0cb9b47dfee13f476b,

title = "Characterisation of residual stress in dielectric films studied by automated wafer mapping",

author = "Ross Walker and E Sirotkin and G Schiavone and J.G. Terry and S Smith and A.R. Mount and M.P.Y Desmulliez and Walton, {A J}",

year = "2014",

month = mar,

doi = "10.1109/ICMTS.2014.6841475",

language = "English",

pages = "98--103",

booktitle = "Microelectronic Test Structures (ICMTS), 2014 International Conference on",

publisher = "Institute of Electrical and Electronics Engineers (IEEE)",

address = "United States",

}

Walker, R, Sirotkin, E, Schiavone, G, Terry, JG , Smith, S , Mount, AR, Desmulliez, MPY & Walton, AJ 2014, Characterisation of residual stress in dielectric films studied by automated wafer mapping. in Microelectronic Test Structures (ICMTS), 2014 International Conference on. Institute of Electrical and Electronics Engineers (IEEE), pp. 98-103. https://doi.org/10.1109/ICMTS.2014.6841475

Characterisation of residual stress in dielectric films studied by automated wafer mapping. / Walker, Ross; Sirotkin, E; Schiavone, G; Terry, J.G.; Smith, S ; Mount, A.R.; Desmulliez, M.P.Y; Walton, A J.

Microelectronic Test Structures (ICMTS), 2014 International Conference on. Institute of Electrical and Electronics Engineers (IEEE), 2014. p. 98-103.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Characterisation of residual stress in dielectric films studied by automated wafer mapping

AU - Walker, Ross

AU - Sirotkin, E

AU - Schiavone, G

AU - Terry, J.G.

AU - Smith, S

AU - Mount, A.R.

AU - Desmulliez, M.P.Y

AU - Walton, A J

PY - 2014/3

Y1 - 2014/3

U2 - 10.1109/ICMTS.2014.6841475

DO - 10.1109/ICMTS.2014.6841475

M3 - Conference contribution

SP - 98

EP - 103

BT - Microelectronic Test Structures (ICMTS), 2014 International Conference on

PB - Institute of Electrical and Electronics Engineers (IEEE)

ER -

Characterisation of residual stress in dielectric films studied by automated wafer mapping

Access to Document

SMART microsystems

Cite this