Characterization of mask alignment offsets using null wire segment holograms and a progressive offset technique

S. A. AbuGhazaleh*, P. Christie, S. Smith, A. M. Gundlach, J. T.M. Stevenson, A. J. Walton

*Corresponding author for this work

Research output: Contribution to conferencePaperpeer-review

Abstract / Description of output

This paper presents data characterizing alignment offsets in a commercial 1 μm fabrication process using a combination of null wire segment holograms and a progressive offset technique. The test structure is essentially a binary computer generated hologram constructed from wire segments and its designed to project a null image when the masks for the process are in prefect alignment. Characterization using the technique indicates a mask misalignment of between 0.1 and 0.3 μm, and this is confirmed using atomic force microscopy.

Original languageEnglish
Pages15-20
Number of pages6
Publication statusPublished - 1 Jan 2000
EventICMTS 2000 - The International Conference on Microelectronic Test Structures - Monterey, CA, USA
Duration: 13 Mar 200016 Mar 2000

Conference

ConferenceICMTS 2000 - The International Conference on Microelectronic Test Structures
CityMonterey, CA, USA
Period13/03/0016/03/00

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