Abstract / Description of output
This paper presents data characterizing alignment offsets in a commercial 1 μm fabrication process using a combination of null wire segment holograms and a progressive offset technique. The test structure is essentially a binary computer generated hologram constructed from wire segments and its designed to project a null image when the masks for the process are in prefect alignment. Characterization using the technique indicates a mask misalignment of between 0.1 and 0.3 μm, and this is confirmed using atomic force microscopy.
Original language | English |
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Pages | 15-20 |
Number of pages | 6 |
Publication status | Published - 1 Jan 2000 |
Event | ICMTS 2000 - The International Conference on Microelectronic Test Structures - Monterey, CA, USA Duration: 13 Mar 2000 → 16 Mar 2000 |
Conference
Conference | ICMTS 2000 - The International Conference on Microelectronic Test Structures |
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City | Monterey, CA, USA |
Period | 13/03/00 → 16/03/00 |