Comparison of measurement techniques for advanced photomask metrology

S. Smith, Andreas Tsiamis, M. McCallum, A. C. Hourd, Tom Stevenson, A. J. Walton, R. G. Dixson, R. A. Allen, J. E. Potzick, M. W. Cresswell, N. G. Orji

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This paper compares electrical, optical and AFM measurements of critical dimension (CD) made on a chrome on quartz photomask. Test structures suitable for direct, on-mask electrical probing have been measured using the three techniques and the results show very good agreement between the electrical measurements and those made with a calibrated CD-AFM system.

Original languageEnglish
Title of host publication2008 IEEE INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, CONFERENCE PROCEEDINGS
Place of PublicationNEW YORK
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
Pages35-39
Number of pages5
ISBN (Print)978-1-4244-1800-8
Publication statusPublished - 2008
EventIEEE International Conference on Microelectronic Test Structures - Edinburgh
Duration: 24 Mar 200827 Mar 2008

Conference

ConferenceIEEE International Conference on Microelectronic Test Structures
CityEdinburgh
Period24/03/0827/03/08

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