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This paper compares electrical, optical and AFM measurements of critical dimension (CD) made on a chrome on quartz photomask. Test structures suitable for direct, on-mask electrical probing have been measured using the three techniques and the results show very good agreement between the electrical measurements and those made with a calibrated CD-AFM system.
|Title of host publication||2008 IEEE INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, CONFERENCE PROCEEDINGS|
|Place of Publication||NEW YORK|
|Publisher||Institute of Electrical and Electronics Engineers (IEEE)|
|Number of pages||5|
|Publication status||Published - 2008|
|Event||IEEE International Conference on Microelectronic Test Structures - Edinburgh|
Duration: 24 Mar 2008 → 27 Mar 2008
|Conference||IEEE International Conference on Microelectronic Test Structures|
|Period||24/03/08 → 27/03/08|
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