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Abstract / Description of output
This paper compares electrical, optical and AFM measurements of critical dimension (CD) made on a chrome on quartz photomask. Test structures suitable for direct, on-mask electrical probing have been measured using the three techniques and the results show very good agreement between the electrical measurements and those made with a calibrated CD-AFM system.
|Title of host publication
|2008 IEEE INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, CONFERENCE PROCEEDINGS
|Place of Publication
|Institute of Electrical and Electronics Engineers (IEEE)
|Number of pages
|Published - 2008
|IEEE International Conference on Microelectronic Test Structures - Edinburgh
Duration: 24 Mar 2008 → 27 Mar 2008
|IEEE International Conference on Microelectronic Test Structures
|24/03/08 → 27/03/08
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