Comparison of optical and electrical measurement techniques for CD metrology on alternating aperture phase-shifting masks

S. Smith, Andreas Tsiamis, M. McCallum, A. C. Hourd, Tom Stevenson, A. J. Walton

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This paper presents a comparison of optical and electrical techniques for critical dimension (CD) metrology on binary and alternating aperture phase shifting masks. For the first time, measurements obtained from on-mask electrical CD structures are compared with optical measurements made using a deep ultra-violet (DUV) mask metrology system. Initial results show that the presence of alternating phase shifting trenches between the chrome blocking features has a detrimental effect on the optical measurements. In addition the optical metrology system appears to have problems with the measurement of the narrowest isolated features due to calibration related issues. Electrical CD measurements are seen as a way of probing the limits of optical tool calibration, and for highlighting and managing the need to extend the complexity of the calibration schedule.

Original languageEnglish
Title of host publicationICMTS 2006: Proceedings of the 2006 International Conference on Microelectronic Test Structures
Place of PublicationNEW YORK
PublisherIEEE, ELECTRON DEVICES SOC & RELIABILITY GROUP
Pages119-123
Number of pages5
ISBN (Print)1-4244-0167-4
Publication statusPublished - 2006
EventInternational Conference on Microelectronic Test Structures (ICMTS 2006) - Austin
Duration: 6 Mar 20069 Mar 2006

Conference

ConferenceInternational Conference on Microelectronic Test Structures (ICMTS 2006)
CityAustin
Period6/03/069/03/06

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