Abstract
This paper presents a comparison of optical and electrical techniques for critical dimension (CD) metrology on binary and alternating aperture phase shifting masks. For the first time, measurements obtained from on-mask electrical CD structures are compared with optical measurements made using a deep ultra-violet (DUV) mask metrology system. Initial results show that the presence of alternating phase shifting trenches between the chrome blocking features has a detrimental effect on the optical measurements. In addition the optical metrology system appears to have problems with the measurement of the narrowest isolated features due to calibration related issues. Electrical CD measurements are seen as a way of probing the limits of optical tool calibration, and for highlighting and managing the need to extend the complexity of the calibration schedule.
Original language | English |
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Title of host publication | ICMTS 2006: Proceedings of the 2006 International Conference on Microelectronic Test Structures |
Place of Publication | NEW YORK |
Publisher | IEEE, ELECTRON DEVICES SOC & RELIABILITY GROUP |
Pages | 119-123 |
Number of pages | 5 |
ISBN (Print) | 1-4244-0167-4 |
Publication status | Published - 2006 |
Event | International Conference on Microelectronic Test Structures (ICMTS 2006) - Austin Duration: 6 Mar 2006 → 9 Mar 2006 |
Conference
Conference | International Conference on Microelectronic Test Structures (ICMTS 2006) |
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City | Austin |
Period | 6/03/06 → 9/03/06 |