Development of an Advanced System for Automated 200 mm Wafer Mapping of Stress Using Test Structures

Sarrah Lokhandwala, Jeremy Murray, Stewart Smith, Andrew Mount, Jonathan Terry, Anthony Walton

Research output: Contribution to conferencePaperpeer-review

Abstract

Controlling and understanding the stress in materials is of major importance in the successful fabrication of MEMS devices. Failure to properly account for stress related effects can lead to the substrate warping and layer delamination, both of which are detrimental to the performance and reliability of components. Hence, it is desirable to have reliable and automated technology to spatially monitor both stress and strain on silicon wafers. This paper reports in detail an integrated measurement system that has been specifically designed to semi-automatically wafer map stress, strain and Young’s modulus. The measurement system is designed to determine the rotation of a test structure automatically and then calculate the strain. Young’s modulus is then determined using a nanoindenter running customised software and the combination of the two measurements from the same location is used to calculate and map the spatial stress in the film.
Original languageEnglish
Pages125-130
Number of pages6
Publication statusPublished - 28 Mar 2017
EventInternational Conference on Microelectronic Test Structures - Grenoble, France
Duration: 28 Mar 201730 Mar 2017

Conference

ConferenceInternational Conference on Microelectronic Test Structures
Abbreviated titleICMTS
CountryFrance
CityGrenoble
Period28/03/1730/03/17

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