Dry etching of SiC in inductively coupled Cl2/Ar plasma

L. Jiang, N. O. V. Plank, R. Cheung, M. A. Blauw, E. van der Drift

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageUndefined/Unknown
Title of host publication47th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
Publication statusPublished - 2003

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