Dry etching of SiC in inductively coupled Cl2/Ar plasma

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	Undefined/Unknown
Title of host publication	47th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
Publication status	Published - 2003

Cite this

@inproceedings{4ee0f37e0674497ba789b99e59979a14,

title = "Dry etching of SiC in inductively coupled Cl2/Ar plasma",

author = "L. Jiang and Plank, \{N. O. V.\} and R. Cheung and Blauw, \{M. A.\} and Drift, \{E. van der\}",

year = "2003",

language = "Undefined/Unknown",

booktitle = "47th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication",

}