Electrical measurement of on-mask mismatch resistor structures

Stewart Smith; Andreas Tsiamis; M. McCallum; A. C. Hourd; Tom Stevenson; Anthony Walton

Electrical measurement of on-mask mismatch resistor structures

Stewart Smith, Andreas Tsiamis, M. McCallum, A. C. Hourd, Tom Stevenson, Anthony Walton

School of Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

This paper describes the design and measurement of electrically measured test structures for the characterisation of dimensional mismatch in an advanced photomask making process. Test structures consisting of pairs of Kelvin connected bridge resistors have been fabricated on a chrome-on-quartz photomask plate. These have been electrically measured on-mask and the results used to obtain information about dimensional mismatch in the mask making process.

Original language	English
Title of host publication	2007 IEEE INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, PROCEEDINGS
Place of Publication	NEW YORK
Publisher	Institute of Electrical and Electronics Engineers
Pages	38
Number of pages	6
ISBN (Print)	978-1-4244-0780-4
Publication status	Published - 2007
Event	IEEE International Conference on Microelectronic Test Structures - Tokyo Duration: 19 Mar 2007 → 22 Mar 2007

Conference

Conference	IEEE International Conference on Microelectronic Test Structures
City	Tokyo
Period	19/03/07 → 22/03/07

Keywords / Materials (for Non-textual outputs)

LITHOGRAPHY
CD

Cite this

@inproceedings{6ed63d82aa2545edb76bff29b570ff23,

title = "Electrical measurement of on-mask mismatch resistor structures",

abstract = "This paper describes the design and measurement of electrically measured test structures for the characterisation of dimensional mismatch in an advanced photomask making process. Test structures consisting of pairs of Kelvin connected bridge resistors have been fabricated on a chrome-on-quartz photomask plate. These have been electrically measured on-mask and the results used to obtain information about dimensional mismatch in the mask making process.",

keywords = "LITHOGRAPHY, CD",

author = "Stewart Smith and Andreas Tsiamis and M. McCallum and Hourd, {A. C.} and Tom Stevenson and Anthony Walton",

year = "2007",

language = "English",

isbn = "978-1-4244-0780-4",

pages = "38",

booktitle = "2007 IEEE INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, PROCEEDINGS",

publisher = "Institute of Electrical and Electronics Engineers",

address = "United States",

note = "IEEE International Conference on Microelectronic Test Structures ; Conference date: 19-03-2007 Through 22-03-2007",

}

Smith, S , Tsiamis, A, McCallum, M, Hourd, AC, Stevenson, T & Walton, A 2007, Electrical measurement of on-mask mismatch resistor structures. in 2007 IEEE INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, PROCEEDINGS. Institute of Electrical and Electronics Engineers, NEW YORK, pp. 38, IEEE International Conference on Microelectronic Test Structures, Tokyo, 19/03/07.

TY - GEN

T1 - Electrical measurement of on-mask mismatch resistor structures

AU - Smith, Stewart

AU - Tsiamis, Andreas

AU - McCallum, M.

AU - Hourd, A. C.

AU - Stevenson, Tom

AU - Walton, Anthony

PY - 2007

Y1 - 2007

N2 - This paper describes the design and measurement of electrically measured test structures for the characterisation of dimensional mismatch in an advanced photomask making process. Test structures consisting of pairs of Kelvin connected bridge resistors have been fabricated on a chrome-on-quartz photomask plate. These have been electrically measured on-mask and the results used to obtain information about dimensional mismatch in the mask making process.

AB - This paper describes the design and measurement of electrically measured test structures for the characterisation of dimensional mismatch in an advanced photomask making process. Test structures consisting of pairs of Kelvin connected bridge resistors have been fabricated on a chrome-on-quartz photomask plate. These have been electrically measured on-mask and the results used to obtain information about dimensional mismatch in the mask making process.

KW - LITHOGRAPHY

KW - CD

M3 - Conference contribution

SN - 978-1-4244-0780-4

SP - 38

BT - 2007 IEEE INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, PROCEEDINGS

PB - Institute of Electrical and Electronics Engineers

CY - NEW YORK

T2 - IEEE International Conference on Microelectronic Test Structures

Y2 - 19 March 2007 through 22 March 2007

ER -

Electrical measurement of on-mask mismatch resistor structures

Abstract

Conference

Keywords / Materials (for Non-textual outputs)

Fingerprint

Cite this