Abstract
This paper describes the design and measurement of electrically measured test structures for the characterisation of dimensional mismatch in an advanced photomask making process. Test structures consisting of pairs of Kelvin connected bridge resistors have been fabricated on a chrome-on-quartz photomask plate. These have been electrically measured on-mask and the results used to obtain information about dimensional mismatch in the mask making process.
Original language | English |
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Title of host publication | 2007 IEEE INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, PROCEEDINGS |
Place of Publication | NEW YORK |
Publisher | Institute of Electrical and Electronics Engineers |
Pages | 38 |
Number of pages | 6 |
ISBN (Print) | 978-1-4244-0780-4 |
Publication status | Published - 2007 |
Event | IEEE International Conference on Microelectronic Test Structures - Tokyo Duration: 19 Mar 2007 → 22 Mar 2007 |
Conference
Conference | IEEE International Conference on Microelectronic Test Structures |
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City | Tokyo |
Period | 19/03/07 → 22/03/07 |
Keywords / Materials (for Non-textual outputs)
- LITHOGRAPHY
- CD