Electrical measurement of on-mask mismatch resistor structures

Stewart Smith, Andreas Tsiamis, M. McCallum, A. C. Hourd, Tom Stevenson, Anthony Walton

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This paper describes the design and measurement of electrically measured test structures for the characterisation of dimensional mismatch in an advanced photomask making process. Test structures consisting of pairs of Kelvin connected bridge resistors have been fabricated on a chrome-on-quartz photomask plate. These have been electrically measured on-mask and the results used to obtain information about dimensional mismatch in the mask making process.

Original languageEnglish
Title of host publication2007 IEEE INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, PROCEEDINGS
Place of PublicationNEW YORK
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
Pages38
Number of pages6
ISBN (Print)978-1-4244-0780-4
Publication statusPublished - 2007
EventIEEE International Conference on Microelectronic Test Structures - Tokyo
Duration: 19 Mar 200722 Mar 2007

Conference

ConferenceIEEE International Conference on Microelectronic Test Structures
CityTokyo
Period19/03/0722/03/07

Keywords

  • LITHOGRAPHY
  • CD

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