Electrochromic and Colorimetric Properties of Nickel(II) Oxide Thin Films Prepared by Aerosol-Assisted Chemical Vapor Deposition

Muhammad Z. Sialvi, Roger J. Mortimer*, Geoffrey D. Wilcox, Asri Mat Teridi, Thomas S. Varley, K. G. Upul Wijayantha, Caroline A. Kirk

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Aerosol-assisted chemical vapor deposition (AACVD) was used for the first time in the preparation of thin-film electrochromic nickel(II) oxide (NiO). The as-deposited films were cubic NiO, with an octahedral like grain structure, and an optical band gap that decreased from 3.61 to 3.48 eV on increase in film thickness (in the range 500-1000 nm). On oxidative voltammetric cycling in aqueous KOH (0 1 mol dm(-3)) electrolyte, the morphology gradually changed to an open porous NiO structure. The electrochromic properties of the films were investigated as a function of film thickness, following 50, 100, and 500 conditioning oxidative voltammetric cycles in aqueous KOH (0.1 mol dm(-3)). Light modulation of the films increased with the number of conditioning cycles. The maximum coloration efficiency (CE) for the NiO (transmissive light green, the "bleached" state) to NiOOH (deep brown, the colored state) electrochromic process was found to be 56.3 cm(2) C-1 (at 450 nm) for films prepared by AACVD for 15 min followed by 100 ''bleached"-to-colored conditioning oxidative voltammetric cycles. Electrochromic response times were

Original languageEnglish
Pages (from-to)5675-5682
Number of pages8
JournalACS Applied Materials & Interfaces
Volume5
Issue number12
DOIs
Publication statusPublished - 26 Jun 2013

Keywords

  • AACVD
  • nickel(II) oxide
  • electrochromic
  • electrochromism
  • CIE chromaticity coordinates
  • colorimetry
  • GROWTH
  • NIOX

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