Etch mechanism and etch-induced effects in the inductively coupled plasma (ICP) etching of GaN

Rebecca Cheung, B. Rong, E. van der Drift, W. G. Sloof

Research output: Contribution to journalArticlepeer-review

Original languageUndefined/Unknown
Pages (from-to)1268-1272
Number of pages5
JournalJournal of Vacuum Science and Technology B
VolumeB21
Publication statusPublished - 2003

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