Extending the resolution of optical lithography using the evanescent near field

S. J. McNab, R. J. Blaikie, M. M. Alkaisi, D. R. S. Cumming, R. Cheung

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageUndefined/Unknown
Title of host publicationProceedings of Fifth Electronics New Zealand Conference
Pages4
Number of pages1
Publication statusPublished - 1998

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