Fabrication of 200nm field effect transistors by X-ray Lithography using a laser-plasma X-ray source

C. M. Reeves, I. C. E. Turcu, Tom Stevenson, A. W. S. Ross, A. M. Gundlach, P. Prewett, R. A. Lawes, P. Anastasi, R. Burge, P. Mitchell

Research output: Contribution to journalArticlepeer-review

Original languageUndefined/Unknown
Pages (from-to)187-190
Number of pages4
JournalMicrocircuit Engineering
Publication statusPublished - 1996

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