Fabrication of electrical linewidth structures capable of TEM measurement using standard 〈100〉 wafers

C. G. Munro*, A. M. Gundlach, J. T.M. Stevenson, D. W. Travis, S. Smith, N. S. Rankin, A. J. Walton

*Corresponding author for this work

Research output: Contribution to conferencePaperpeer-review

Abstract

This paper presents details of a process for fabricating electrical linewidth structures over etched windows so that they potentially can be inspected with a TEM. These ELISTEMs (Electrical LInewidth Structures for TEM) are fabricated using standard 〈100〉 silicon wafers. Measurements are compared with those obtained for conventional linewidth structures.

Original languageEnglish
Pages13-17
Number of pages5
Publication statusPublished - 1 Jan 1999
EventProceedings of the 1999 International Conference on Microelectronic Test Structures, ICMTS 1999 - Goteborg, Swed
Duration: 15 Mar 199918 Mar 1999

Conference

ConferenceProceedings of the 1999 International Conference on Microelectronic Test Structures, ICMTS 1999
CityGoteborg, Swed
Period15/03/9918/03/99

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