Fabrication of sub-50nm poly-Si/$ SiO sub 2 $/Si narrow wires using electron beam lithography and $ CF sub 4 $ / $ O sub 2 $ reactive ion etching

Y. S. Tang, Rebecca Cheung, C. D. W. Wilkinson

Research output: Contribution to journalArticlepeer-review

Original languageUndefined/Unknown
Pages (from-to)1823-1824
Number of pages2
JournalElectronics Letters
Volume26
Publication statusPublished - 1990

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