Fabrication of Test Structures to Monitor Stress in SU-8 Films used for MEMS Applications

S. Smith; N. L. Brockie; J. Murray; C. J. Wilson; A. B. Horsfall; Jonathan Terry; Tom Stevenson; Andrew Mount; Anthony Walton

Fabrication of Test Structures to Monitor Stress in SU-8 Films used for MEMS Applications

S. Smith, N. L. Brockie, J. Murray, C. J. Wilson, A. B. Horsfall, Jonathan Terry, Tom Stevenson, Andrew Mount, Anthony Walton

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

SU-8, an epoxy based negative photoresist, is widely used in the manufacture of micromechanical systems but can exhibit significant levels of stress build-up during processing. This paper describes micromechanical test structures that provide the opportunity to spatially characterise stress the in SU-8 at different stages of the process. The structures are fabricated in a thick layer of SU-8 and are subsequently released from the underlying substrate using a dry chemical vapour etch process. The initial results indicate that there is significant tensile stress in the SU-8, and that this demonstrates a radial variation along with a dependence on the process conditions.

Original language	English
Title of host publication	2010 INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, 23RD IEEE ICMTS CONFERENCE PROCEEDINGS
Place of Publication	NEW YORK
Publisher	Institute of Electrical and Electronics Engineers
Pages	813
Number of pages	6
ISBN (Print)	978-1-4244-6915-4
Publication status	Published - 2010
Event	23rd International Conference on Microelectronic Test Structures (ICMTS) - Hiroshima Duration: 22 Mar 2010 → 25 Mar 2010

Conference

Conference	23rd International Conference on Microelectronic Test Structures (ICMTS)
City	Hiroshima
Period	22/03/10 → 25/03/10

Keywords / Materials (for Non-textual outputs)

THIN-FILMS

SMART microsystems
Walton, A. (Principal Investigator)
EPSRC
1/04/10 → 28/02/15
Project: Research
manufacturability of Monolithic, Ferromagentic Core, Power Inductors
Walton, A. (Principal Investigator)
Non-EU industry, commerce and public corporations
1/12/06 → 30/11/11
Project: Research
RCUK Fellowship
Smith, S. (Principal Investigator), Anderton, S. (Co-investigator), Bagnaninchi, P. (Co-investigator), Blythe, R. (Co-investigator), Calvert, J. (Co-investigator), Downes, A. (Co-investigator), Frame, M. (Co-investigator), Hay, D. (Co-investigator), Popovic, N. (Co-investigator) & Rambaut, A. (Co-investigator)
EPSRC, STFC
1/10/06 → 30/06/13
Project: Research

Cite this

Smith, S., Brockie, N. L., Murray, J., Wilson, C. J., Horsfall, A. B., Terry, J., Stevenson, T., Mount, A., & Walton, A. (2010). Fabrication of Test Structures to Monitor Stress in SU-8 Films used for MEMS Applications. In 2010 INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, 23RD IEEE ICMTS CONFERENCE PROCEEDINGS (pp. 813). Institute of Electrical and Electronics Engineers.

@inproceedings{1db742f5a75848858d5954e055552113,

title = "Fabrication of Test Structures to Monitor Stress in SU-8 Films used for MEMS Applications",

abstract = "SU-8, an epoxy based negative photoresist, is widely used in the manufacture of micromechanical systems but can exhibit significant levels of stress build-up during processing. This paper describes micromechanical test structures that provide the opportunity to spatially characterise stress the in SU-8 at different stages of the process. The structures are fabricated in a thick layer of SU-8 and are subsequently released from the underlying substrate using a dry chemical vapour etch process. The initial results indicate that there is significant tensile stress in the SU-8, and that this demonstrates a radial variation along with a dependence on the process conditions.",

keywords = "THIN-FILMS",

author = "S. Smith and Brockie, {N. L.} and J. Murray and Wilson, {C. J.} and Horsfall, {A. B.} and Jonathan Terry and Tom Stevenson and Andrew Mount and Anthony Walton",

year = "2010",

language = "English",

isbn = "978-1-4244-6915-4",

pages = "813",

booktitle = "2010 INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, 23RD IEEE ICMTS CONFERENCE PROCEEDINGS",

publisher = "Institute of Electrical and Electronics Engineers",

address = "United States",

note = "23rd International Conference on Microelectronic Test Structures (ICMTS) ; Conference date: 22-03-2010 Through 25-03-2010",

}

Smith, S, Brockie, NL, Murray, J, Wilson, CJ, Horsfall, AB, Terry, J, Stevenson, T, Mount, A & Walton, A 2010, Fabrication of Test Structures to Monitor Stress in SU-8 Films used for MEMS Applications. in 2010 INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, 23RD IEEE ICMTS CONFERENCE PROCEEDINGS. Institute of Electrical and Electronics Engineers, NEW YORK, pp. 813, 23rd International Conference on Microelectronic Test Structures (ICMTS), Hiroshima, 22/03/10.

Fabrication of Test Structures to Monitor Stress in SU-8 Films used for MEMS Applications. / Smith, S.; Brockie, N. L.; Murray, J. et al.
2010 INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, 23RD IEEE ICMTS CONFERENCE PROCEEDINGS. NEW YORK: Institute of Electrical and Electronics Engineers, 2010. p. 813.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Fabrication of Test Structures to Monitor Stress in SU-8 Films used for MEMS Applications

AU - Smith, S.

AU - Brockie, N. L.

AU - Murray, J.

AU - Wilson, C. J.

AU - Horsfall, A. B.

AU - Terry, Jonathan

AU - Stevenson, Tom

AU - Mount, Andrew

AU - Walton, Anthony

PY - 2010

Y1 - 2010

N2 - SU-8, an epoxy based negative photoresist, is widely used in the manufacture of micromechanical systems but can exhibit significant levels of stress build-up during processing. This paper describes micromechanical test structures that provide the opportunity to spatially characterise stress the in SU-8 at different stages of the process. The structures are fabricated in a thick layer of SU-8 and are subsequently released from the underlying substrate using a dry chemical vapour etch process. The initial results indicate that there is significant tensile stress in the SU-8, and that this demonstrates a radial variation along with a dependence on the process conditions.

AB - SU-8, an epoxy based negative photoresist, is widely used in the manufacture of micromechanical systems but can exhibit significant levels of stress build-up during processing. This paper describes micromechanical test structures that provide the opportunity to spatially characterise stress the in SU-8 at different stages of the process. The structures are fabricated in a thick layer of SU-8 and are subsequently released from the underlying substrate using a dry chemical vapour etch process. The initial results indicate that there is significant tensile stress in the SU-8, and that this demonstrates a radial variation along with a dependence on the process conditions.

KW - THIN-FILMS

M3 - Conference contribution

SN - 978-1-4244-6915-4

SP - 813

BT - 2010 INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, 23RD IEEE ICMTS CONFERENCE PROCEEDINGS

PB - Institute of Electrical and Electronics Engineers

CY - NEW YORK

T2 - 23rd International Conference on Microelectronic Test Structures (ICMTS)

Y2 - 22 March 2010 through 25 March 2010

ER -

Fabrication of Test Structures to Monitor Stress in SU-8 Films used for MEMS Applications

Abstract

Conference

Keywords / Materials (for Non-textual outputs)

Fingerprint

Projects

SMART microsystems

manufacturability of Monolithic, Ferromagentic Core, Power Inductors

RCUK Fellowship

Cite this