High resolution reactive ion etching and damage effects in the $ Si/Ge sub x Si sub 1-x $ system

Rebecca Cheung, T. Zijlstra, E. van der Drift, L. J. Geerligs, K. Werner, S. Radelaar

Research output: Contribution to journalArticlepeer-review

Original languageUndefined/Unknown
Pages (from-to)2224-2228
Number of pages5
JournalJournal of Vacuum Science and Technology B
Publication statusPublished - 1993

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