Implications of halo and well implant conditions on sub-140nm device technologies

M. A. Foad, Ruth Doherty, H. Ito, Y. Matsunaga, K. Mitsuda, M. Honda, S. Ikeda, D. Hess, B. Brown (Editor), T. L. Alford (Editor), M. Nastasi (Editor), M. C. Vella (Editor)

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)369-372
Number of pages4
JournalIit2002: ion implantation technology, proceedings
Publication statusPublished - 2003

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