Original language | English |
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Pages (from-to) | 369-372 |
Number of pages | 4 |
Journal | Iit2002: ion implantation technology, proceedings |
Publication status | Published - 2003 |
Implications of halo and well implant conditions on sub-140nm device technologies
M. A. Foad, Ruth Doherty, H. Ito, Y. Matsunaga, K. Mitsuda, M. Honda, S. Ikeda, D. Hess, B. Brown (Editor), T. L. Alford (Editor), M. Nastasi (Editor), M. C. Vella (Editor)
Research output: Contribution to journal › Article › peer-review