Implications of halo and well implant conditions on sub-140nm device technologies

M. A. Foad; Ruth Doherty; H. Ito; Y. Matsunaga; K. Mitsuda; M. Honda; S. Ikeda; D. Hess; B. Brown; T. L. Alford; M. Nastasi; M. C. Vella

Implications of halo and well implant conditions on sub-140nm device technologies

M. A. Foad
, Ruth Doherty
, H. Ito
, Y. Matsunaga
, K. Mitsuda
, M. Honda
, S. Ikeda
, D. Hess
, B. Brown (Editor)
, T. L. Alford (Editor)
, M. Nastasi (Editor)
, M. C. Vella (Editor)

School of Geosciences

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	369-372
Number of pages	4
Journal	Iit2002: ion implantation technology, proceedings
Publication status	Published - 2003

Cite this

@article{cbc5dc2da45d4afa899f94c0a14c77c5,

title = "Implications of halo and well implant conditions on sub-140nm device technologies",

author = "Foad, \{M. A.\} and Ruth Doherty and H. Ito and Y. Matsunaga and K. Mitsuda and M. Honda and S. Ikeda and D. Hess and B. Brown and Alford, \{T. L.\} and M. Nastasi and Vella, \{M. C.\}",

year = "2003",

language = "English",

pages = "369--372",

journal = "Iit2002: ion implantation technology, proceedings",

}

TY - JOUR

T1 - Implications of halo and well implant conditions on sub-140nm device technologies

AU - Foad, M. A.

AU - Doherty, Ruth

AU - Ito, H.

AU - Matsunaga, Y.

AU - Mitsuda, K.

AU - Honda, M.

AU - Ikeda, S.

AU - Hess, D.

A2 - Brown, B.

A2 - Alford, T. L.

A2 - Nastasi, M.

A2 - Vella, M. C.

PY - 2003

Y1 - 2003

M3 - Article

SP - 369

EP - 372

JO - Iit2002: ion implantation technology, proceedings

JF - Iit2002: ion implantation technology, proceedings

ER -