Inductively coupled plasma (ICP) etching of GaN and its effect on electrical characteristics

B. Rong, E. van der Drift, R. J. Reeves, Rebecca Cheung

Research output: Contribution to journalArticlepeer-review

Original languageUndefined/Unknown
Pages (from-to)2917-2920
Number of pages4
JournalJournal of Vacuum Science and Technology B
Volume19
Publication statusPublished - 2001

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