Original language | Undefined/Unknown |
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Pages (from-to) | 2917-2920 |
Number of pages | 4 |
Journal | Journal of Vacuum Science and Technology B |
Volume | 19 |
Publication status | Published - 2001 |
Inductively coupled plasma (ICP) etching of GaN and its effect on electrical characteristics
B. Rong, E. van der Drift, R. J. Reeves, Rebecca Cheung
Research output: Contribution to journal › Article › peer-review