Investigation of Optical Proximity Correction (OPC) and non-uniformities on the performance of resistivity and linewidth measurements

S Smith, A J Walton, M Fallon

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The effect of Optical Proximity Correction (OPC) on test structures is examined using DEPICT for the lithography simulation and MEDICI for the electrical calculations. It is concluded that OPC can be successfully used to reduce line shortening due to the voltage taps without causing necking effects on the track being measured. The effect of asymmetries (which may be introduced as a result of OPC) on the measurement of Greek crosses are also addressed and methods of accurately extracting sheet resistance from structures exhibiting these effects are discussed.

Original languageEnglish
Title of host publicationICMTS 1999: PROCEEDINGS OF THE 1999 INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES
Place of PublicationNEW YORK
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
Pages161-166
Number of pages6
ISBN (Print)0-7803-5270-X
Publication statusPublished - 1999
EventInternational Conference on Microelectronic Test Structures - GOTHENBURG
Duration: 15 Mar 199918 Mar 1999

Conference

ConferenceInternational Conference on Microelectronic Test Structures
CityGOTHENBURG
Period15/03/9918/03/99

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