Investigation of Optical Proximity Correction (OPC) and non-uniformities on the performance of resistivity and linewidth measurements

S  Smith; A J  Walton; M  Fallon

Investigation of Optical Proximity Correction (OPC) and non-uniformities on the performance of resistivity and linewidth measurements

S Smith, A J Walton, M Fallon

School of Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

The effect of Optical Proximity Correction (OPC) on test structures is examined using DEPICT for the lithography simulation and MEDICI for the electrical calculations. It is concluded that OPC can be successfully used to reduce line shortening due to the voltage taps without causing necking effects on the track being measured. The effect of asymmetries (which may be introduced as a result of OPC) on the measurement of Greek crosses are also addressed and methods of accurately extracting sheet resistance from structures exhibiting these effects are discussed.

Original language	English
Title of host publication	ICMTS 1999: PROCEEDINGS OF THE 1999 INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES
Place of Publication	NEW YORK
Publisher	Institute of Electrical and Electronics Engineers
Pages	161-166
Number of pages	6
ISBN (Print)	0-7803-5270-X
Publication status	Published - 1999
Event	International Conference on Microelectronic Test Structures - GOTHENBURG Duration: 15 Mar 1999 → 18 Mar 1999

Conference

Conference	International Conference on Microelectronic Test Structures
City	GOTHENBURG
Period	15/03/99 → 18/03/99

Cite this

@inproceedings{0175570745c64028812cdfde5c3f003d,

title = "Investigation of Optical Proximity Correction (OPC) and non-uniformities on the performance of resistivity and linewidth measurements",

abstract = "The effect of Optical Proximity Correction (OPC) on test structures is examined using DEPICT for the lithography simulation and MEDICI for the electrical calculations. It is concluded that OPC can be successfully used to reduce line shortening due to the voltage taps without causing necking effects on the track being measured. The effect of asymmetries (which may be introduced as a result of OPC) on the measurement of Greek crosses are also addressed and methods of accurately extracting sheet resistance from structures exhibiting these effects are discussed.",

author = "S Smith and Walton, {A J} and M Fallon",

year = "1999",

language = "English",

isbn = "0-7803-5270-X",

pages = "161--166",

booktitle = "ICMTS 1999: PROCEEDINGS OF THE 1999 INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES",

publisher = "Institute of Electrical and Electronics Engineers",

address = "United States",

note = "International Conference on Microelectronic Test Structures ; Conference date: 15-03-1999 Through 18-03-1999",

}

Smith, S, Walton, AJ & Fallon, M 1999, Investigation of Optical Proximity Correction (OPC) and non-uniformities on the performance of resistivity and linewidth measurements. in ICMTS 1999: PROCEEDINGS OF THE 1999 INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES. Institute of Electrical and Electronics Engineers, NEW YORK, pp. 161-166, International Conference on Microelectronic Test Structures, GOTHENBURG, 15/03/99.

Investigation of Optical Proximity Correction (OPC) and non-uniformities on the performance of resistivity and linewidth measurements. / Smith, S ; Walton, A J ; Fallon, M .
ICMTS 1999: PROCEEDINGS OF THE 1999 INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES. NEW YORK: Institute of Electrical and Electronics Engineers, 1999. p. 161-166.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Investigation of Optical Proximity Correction (OPC) and non-uniformities on the performance of resistivity and linewidth measurements

AU - Smith, S

AU - Walton, A J

AU - Fallon, M

PY - 1999

Y1 - 1999

N2 - The effect of Optical Proximity Correction (OPC) on test structures is examined using DEPICT for the lithography simulation and MEDICI for the electrical calculations. It is concluded that OPC can be successfully used to reduce line shortening due to the voltage taps without causing necking effects on the track being measured. The effect of asymmetries (which may be introduced as a result of OPC) on the measurement of Greek crosses are also addressed and methods of accurately extracting sheet resistance from structures exhibiting these effects are discussed.

AB - The effect of Optical Proximity Correction (OPC) on test structures is examined using DEPICT for the lithography simulation and MEDICI for the electrical calculations. It is concluded that OPC can be successfully used to reduce line shortening due to the voltage taps without causing necking effects on the track being measured. The effect of asymmetries (which may be introduced as a result of OPC) on the measurement of Greek crosses are also addressed and methods of accurately extracting sheet resistance from structures exhibiting these effects are discussed.

M3 - Conference contribution

SN - 0-7803-5270-X

SP - 161

EP - 166

BT - ICMTS 1999: PROCEEDINGS OF THE 1999 INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES

PB - Institute of Electrical and Electronics Engineers

CY - NEW YORK

T2 - International Conference on Microelectronic Test Structures

Y2 - 15 March 1999 through 18 March 1999

ER -

Investigation of Optical Proximity Correction (OPC) and non-uniformities on the performance of resistivity and linewidth measurements

Abstract

Conference

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