Laser pulse duration dependence of blister formation on back-radiated Ti thin films for BB-LIFT

Nathan Goodfriend; Sergei V. Starinskiy; Oleg Nerushev; Nadezhda M. Bulgakova; Alexander Bulgakov; Eleanor E.B. Campbell

doi:10.1007/s00339-016-9666-x

Laser pulse duration dependence of blister formation on back-radiated Ti thin films for BB-LIFT

Nathan Goodfriend, Sergei V. Starinskiy, Oleg Nerushev, Nadezhda M. Bulgakova, Alexander Bulgakov, Eleanor E.B. Campbell

Research output: Contribution to journal › Article › peer-review

Abstract

The influence of the laser pulse duration on the mechanism of blister formation in the particle transfer technique, blister-based laser-induced forward transfer, was investigated. Pulses from a fs Ti:Sapphire laser (120 fs, 800 nm) and from a ns Nd:YAG laser (7 ns, 532 nm) were used to directly compare blister formation on thin titanium films of ca. 300 nm thickness, deposited on glass. The different blister morphologies were compared and contrasted by using optical microscopy and atomic force microscopy. The results provide evidence for different blister formation mechanisms: for fs pulses the mechanism is predominantly ablation at the metal–glass interface accompanied by confined plasma expansion and deformation of the remaining metal film; for ns pulses it is heating accompanied by thermal expansion of the metal film.

Original language	English
Article number	154
Number of pages	9
Journal	Applied Physics A: Materials Science and Processing
Volume	122
Issue number	3
Early online date	17 Feb 2016
DOIs	https://doi.org/10.1007/s00339-016-9666-x
Publication status	Published - 1 Mar 2016

Keywords / Materials (for Non-textual outputs)

LIFT
BB-LIFT
ns-laser
fs-laser
thin metal film

Access to Document

10.1007/s00339-016-9666-xLicence: Creative Commons: Attribution (CC-BY)

Appl Phys A 122 154Final published version, 2.19 MBLicence: Creative Commons: Attribution (CC-BY)

http://link.springer.com/article/10.1007%2Fs00339-016-9666-x

Cite this

@article{a06c22be28564804a919a77d4b137512,

title = "Laser pulse duration dependence of blister formation on back-radiated Ti thin films for BB-LIFT",

abstract = "The influence of the laser pulse duration on the mechanism of blister formation in the particle transfer technique, blister-based laser-induced forward transfer, was investigated. Pulses from a fs Ti:Sapphire laser (120 fs, 800 nm) and from a ns Nd:YAG laser (7 ns, 532 nm) were used to directly compare blister formation on thin titanium films of ca. 300 nm thickness, deposited on glass. The different blister morphologies were compared and contrasted by using optical microscopy and atomic force microscopy. The results provide evidence for different blister formation mechanisms: for fs pulses the mechanism is predominantly ablation at the metal–glass interface accompanied by confined plasma expansion and deformation of the remaining metal film; for ns pulses it is heating accompanied by thermal expansion of the metal film.",

keywords = "LIFT, BB-LIFT, ns-laser, fs-laser, thin metal film",

author = "Nathan Goodfriend and Starinskiy, {Sergei V.} and Oleg Nerushev and Bulgakova, {Nadezhda M.} and Alexander Bulgakov and Campbell, {Eleanor E.B.}",

year = "2016",

month = mar,

day = "1",

doi = "10.1007/s00339-016-9666-x",

language = "English",

volume = "122",

journal = "Applied Physics A: Materials Science and Processing",

issn = "0947-8396",

publisher = "Springer",

number = "3",

}

TY - JOUR

T1 - Laser pulse duration dependence of blister formation on back-radiated Ti thin films for BB-LIFT

AU - Goodfriend, Nathan

AU - Starinskiy, Sergei V.

AU - Nerushev, Oleg

AU - Bulgakova, Nadezhda M.

AU - Bulgakov, Alexander

AU - Campbell, Eleanor E.B.

PY - 2016/3/1

Y1 - 2016/3/1

N2 - The influence of the laser pulse duration on the mechanism of blister formation in the particle transfer technique, blister-based laser-induced forward transfer, was investigated. Pulses from a fs Ti:Sapphire laser (120 fs, 800 nm) and from a ns Nd:YAG laser (7 ns, 532 nm) were used to directly compare blister formation on thin titanium films of ca. 300 nm thickness, deposited on glass. The different blister morphologies were compared and contrasted by using optical microscopy and atomic force microscopy. The results provide evidence for different blister formation mechanisms: for fs pulses the mechanism is predominantly ablation at the metal–glass interface accompanied by confined plasma expansion and deformation of the remaining metal film; for ns pulses it is heating accompanied by thermal expansion of the metal film.

AB - The influence of the laser pulse duration on the mechanism of blister formation in the particle transfer technique, blister-based laser-induced forward transfer, was investigated. Pulses from a fs Ti:Sapphire laser (120 fs, 800 nm) and from a ns Nd:YAG laser (7 ns, 532 nm) were used to directly compare blister formation on thin titanium films of ca. 300 nm thickness, deposited on glass. The different blister morphologies were compared and contrasted by using optical microscopy and atomic force microscopy. The results provide evidence for different blister formation mechanisms: for fs pulses the mechanism is predominantly ablation at the metal–glass interface accompanied by confined plasma expansion and deformation of the remaining metal film; for ns pulses it is heating accompanied by thermal expansion of the metal film.

KW - LIFT

KW - BB-LIFT

KW - ns-laser

KW - fs-laser

KW - thin metal film

U2 - 10.1007/s00339-016-9666-x

DO - 10.1007/s00339-016-9666-x

M3 - Article

SN - 0947-8396

VL - 122

JO - Applied Physics A: Materials Science and Processing

JF - Applied Physics A: Materials Science and Processing

IS - 3

M1 - 154

ER -

Laser pulse duration dependence of blister formation on back-radiated Ti thin films for BB-LIFT

Abstract

Keywords / Materials (for Non-textual outputs)

Access to Document

Fingerprint

Cite this