Metal-chalcogenide photoresists for high resolution lithography and sub-micron structures

A. E. Owen, Peter Ewen, A. Zakery, M N Kozicki, Y. Khawaja

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English
Title of host publication	Nanostructure Physics and Fabrication
Subtitle of host publication	proceedings of the international symposium, College Station, Texas, March 13-15, 1989
Editors	M.A. Reed, W.P. Kirk
Place of Publication	Boston
Publisher	Academic Press
Pages	447-451
Number of pages	5
Publication status	Published - 1989

Cite this

@inproceedings{987354c667a949538b558f8f6d351429,

title = "Metal-chalcogenide photoresists for high resolution lithography and sub-micron structures",

author = "Owen, \{A. E.\} and Peter Ewen and A. Zakery and Kozicki, \{M N\} and Y. Khawaja",

year = "1989",

language = "English",

pages = "447--451",

editor = "M.A. Reed and W.P. Kirk",

booktitle = "Nanostructure Physics and Fabrication",

publisher = "Academic Press",

address = "United States",

}

Metal-chalcogenide photoresists for high resolution lithography and sub-micron structures. / Owen, A. E.; Ewen, Peter; Zakery, A. et al.
Nanostructure Physics and Fabrication: proceedings of the international symposium, College Station, Texas, March 13-15, 1989. ed. / M.A. Reed; W.P. Kirk. Boston: Academic Press, 1989. p. 447-451.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Metal-chalcogenide photoresists for high resolution lithography and sub-micron structures

AU - Owen, A. E.

AU - Ewen, Peter

AU - Zakery, A.

AU - Kozicki, M N

AU - Khawaja, Y.

PY - 1989

Y1 - 1989

M3 - Conference contribution

SP - 447

EP - 451

BT - Nanostructure Physics and Fabrication

A2 - Reed, M.A.

A2 - Kirk, W.P.

PB - Academic Press

CY - Boston

ER -