Microelectromechanical systems for biomimetical applications

Rhonira Latif; Enrico Mastropaolo; Andrew Bunting; Rebecca Cheung; Thomas Koickal; Alister Hamilton; Michael Newton; Leslie Smith

doi:10.1116/1.3504892

Microelectromechanical systems for biomimetical applications

Rhonira Latif, Enrico Mastropaolo, Andrew Bunting, Rebecca Cheung, Thomas Koickal, Alister Hamilton, Michael Newton, Leslie Smith

Research output: Contribution to journal › Article › peer-review

Abstract / Description of output

An etch release process capable of releasing long resonant gate transistor bridges from a sacrificial layer has been studied as a step towards developing a system to mimic the cochlear mechanism inside the human ear. The developed etch release process involves the use of a gentle etch tool that is capable of a clean and damage-free etch release. The influence of temperature and oxygen/nitrogen gas flow rates on the undercut etch rates and the profiles of photoresist and polyimide sacrificial layers have been investigated. An array of aluminum bridges of length 0.278-1.618 mm, which cover the frequencies from 1 to 33.86 kHz, has been designed and released from a sacrificial layer. The resonating beams have been measured. (C) 2010 American Vacuum Society. [DOI:10.1116/1.3504892]

Original language	English
Pages (from-to)	C6N1-C6N6
Number of pages	6
Journal	Journal of Vacuum Science and Technology B
Volume	28
Issue number	6
DOIs	https://doi.org/10.1116/1.3504892
Publication status	Published - Nov 2010

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10.1116/1.3504892

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title = "Microelectromechanical systems for biomimetical applications",

abstract = "An etch release process capable of releasing long resonant gate transistor bridges from a sacrificial layer has been studied as a step towards developing a system to mimic the cochlear mechanism inside the human ear. The developed etch release process involves the use of a gentle etch tool that is capable of a clean and damage-free etch release. The influence of temperature and oxygen/nitrogen gas flow rates on the undercut etch rates and the profiles of photoresist and polyimide sacrificial layers have been investigated. An array of aluminum bridges of length 0.278-1.618 mm, which cover the frequencies from 1 to 33.86 kHz, has been designed and released from a sacrificial layer. The resonating beams have been measured. (C) 2010 American Vacuum Society. [DOI:10.1116/1.3504892]",

author = "Rhonira Latif and Enrico Mastropaolo and Andrew Bunting and Rebecca Cheung and Thomas Koickal and Alister Hamilton and Michael Newton and Leslie Smith",

year = "2010",

month = nov,

doi = "10.1116/1.3504892",

language = "English",

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journal = "Journal of Vacuum Science and Technology B",

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T1 - Microelectromechanical systems for biomimetical applications

AU - Latif, Rhonira

AU - Mastropaolo, Enrico

AU - Bunting, Andrew

AU - Cheung, Rebecca

AU - Koickal, Thomas

AU - Hamilton, Alister

AU - Newton, Michael

AU - Smith, Leslie

PY - 2010/11

Y1 - 2010/11

N2 - An etch release process capable of releasing long resonant gate transistor bridges from a sacrificial layer has been studied as a step towards developing a system to mimic the cochlear mechanism inside the human ear. The developed etch release process involves the use of a gentle etch tool that is capable of a clean and damage-free etch release. The influence of temperature and oxygen/nitrogen gas flow rates on the undercut etch rates and the profiles of photoresist and polyimide sacrificial layers have been investigated. An array of aluminum bridges of length 0.278-1.618 mm, which cover the frequencies from 1 to 33.86 kHz, has been designed and released from a sacrificial layer. The resonating beams have been measured. (C) 2010 American Vacuum Society. [DOI:10.1116/1.3504892]

AB - An etch release process capable of releasing long resonant gate transistor bridges from a sacrificial layer has been studied as a step towards developing a system to mimic the cochlear mechanism inside the human ear. The developed etch release process involves the use of a gentle etch tool that is capable of a clean and damage-free etch release. The influence of temperature and oxygen/nitrogen gas flow rates on the undercut etch rates and the profiles of photoresist and polyimide sacrificial layers have been investigated. An array of aluminum bridges of length 0.278-1.618 mm, which cover the frequencies from 1 to 33.86 kHz, has been designed and released from a sacrificial layer. The resonating beams have been measured. (C) 2010 American Vacuum Society. [DOI:10.1116/1.3504892]

U2 - 10.1116/1.3504892

DO - 10.1116/1.3504892

M3 - Article

SN - 1071-1023

VL - 28

SP - C6N1-C6N6

JO - Journal of Vacuum Science and Technology B

JF - Journal of Vacuum Science and Technology B

IS - 6

ER -

Microelectromechanical systems for biomimetical applications

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