Microscopic Quantum Transport Processes of Out-of-Plane Charge Flow in 2D Semiconductors Analyzed by a Fowler–Nordheim Tunneling Probe

Dong Hoon Shin, Duk Hyun Lee, Sang Jun Choi, Seonyeong Kim, Hakseong Kim, Kenji Watanabe, Takashi Taniguchi, Eleanor E.B. Campbell, Sang Wook Lee*, Suyong Jung*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract / Description of output

Weak interlayer couplings at 2D van der Waals (vdW) interfaces fundamentally distinguish out-of-plane charge flow, the information carrier in vdW-assembled vertical electronic and optical devices, from the in-plane band transport processes. Here, the out-of-plane charge transport behavior in 2D vdW semiconducting transition metal dichalcogenides (SCTMD) is reported. The measurements demonstrate that, in the high electric field regime, especially at low temperatures, either electron or hole carrier Fowler–Nordheim (FN) tunneling becomes the dominant quantum transport process in ultrathin SCTMDs, down to monolayers. For few-layer SCTMDs, sequential layer-by-layer FN tunneling is observed to dominate the charge flow, thus serving as a material characterization probe for addressing the Fermi level positions and the layer numbers of the SCTMD films. Furthermore, it is shown that the physical confinement of the electron or hole carrier wave packets inside the sub-nm thick semiconducting layers reduces the vertical quantum tunneling probability, leading to an enhanced effective mass of tunneling carriers.

Original languageEnglish
Article number2300051
JournalAdvanced Electronic Materials
Volume9
Issue number6
Early online date14 Apr 2023
DOIs
Publication statusE-pub ahead of print - 14 Apr 2023

Keywords / Materials (for Non-textual outputs)

  • 2D semiconductors
  • electron and hole field emission
  • Fowler-Nordheim tunneling
  • Schottky-barrier height
  • van der Waals vertical heterostructures

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