Multistep synthesis on SU-8: Combining microfabrication and solid-phase chemistry on a single material

Gabriel Cavalli; Shahanara Banu; Rohan T. Ranasinghe; Graham R. Broder; Hugo F. P. Martins; Cameron Neylon; Hywel Morgan; Mark Bradley; Peter L. Roach

doi:10.1021/cc060079p

Multistep synthesis on SU-8: Combining microfabrication and solid-phase chemistry on a single material

Gabriel Cavalli, Shahanara Banu, Rohan T. Ranasinghe, Graham R. Broder, Hugo F. P. Martins, Cameron Neylon, Hywel Morgan, Mark Bradley, Peter L. Roach

Research output: Contribution to journal › Article › peer-review

Abstract

SU-8 is an epoxy-novolac resin and a well-established negative photoresist for microfabrication and microengineering. The photopolymerized resist is an extremely highly crosslinked polymer showing outstanding chemical and physical robustness with residual surface epoxy groups amenable for chemical functionalization. In this paper we describe, for the first time, the preparation and surface modification of SU-8 particles shaped as microbars, the attachment of appropriate linkers, and the successful application of these particles to multistep solid-phase synthesis leading to oligonucleotides and peptides attached in an unambiguous manner to the support surface.

Original language	English
Pages (from-to)	462-472
Number of pages	11
Journal	Journal of combinatorial chemistry
Volume	9
Issue number	3
DOIs	https://doi.org/10.1021/cc060079p
Publication status	Published - 2007

Keywords / Materials (for Non-textual outputs)

HIGH-ASPECT-RATIO
PEPTIDE-SYNTHESIS
CAPILLARY-ELECTROPHORESIS
PROTEASE INHIBITORS
MASS-SPECTROMETRY
ARCHIP EPOXY
PHOTORESIST
OLIGONUCLEOTIDES
IMMOBILIZATION
MEMS

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10.1021/cc060079p

Basic Technology - 4 billion bases a day - practical individual genome sequencing
Bradley, M.
EPSRC
1/03/05 → 30/04/14
Project: Research

Cite this

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title = "Multistep synthesis on SU-8: Combining microfabrication and solid-phase chemistry on a single material",

abstract = "SU-8 is an epoxy-novolac resin and a well-established negative photoresist for microfabrication and microengineering. The photopolymerized resist is an extremely highly crosslinked polymer showing outstanding chemical and physical robustness with residual surface epoxy groups amenable for chemical functionalization. In this paper we describe, for the first time, the preparation and surface modification of SU-8 particles shaped as microbars, the attachment of appropriate linkers, and the successful application of these particles to multistep solid-phase synthesis leading to oligonucleotides and peptides attached in an unambiguous manner to the support surface.",

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author = "Gabriel Cavalli and Shahanara Banu and Ranasinghe, {Rohan T.} and Broder, {Graham R.} and Martins, {Hugo F. P.} and Cameron Neylon and Hywel Morgan and Mark Bradley and Roach, {Peter L.}",

year = "2007",

doi = "10.1021/cc060079p",

language = "English",

volume = "9",

pages = "462--472",

journal = "Journal of combinatorial chemistry",

issn = "1520-4766",

publisher = "American Chemical Society",

number = "3",

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TY - JOUR

T1 - Multistep synthesis on SU-8: Combining microfabrication and solid-phase chemistry on a single material

AU - Cavalli, Gabriel

AU - Banu, Shahanara

AU - Ranasinghe, Rohan T.

AU - Broder, Graham R.

AU - Martins, Hugo F. P.

AU - Neylon, Cameron

AU - Morgan, Hywel

AU - Bradley, Mark

AU - Roach, Peter L.

PY - 2007

Y1 - 2007

N2 - SU-8 is an epoxy-novolac resin and a well-established negative photoresist for microfabrication and microengineering. The photopolymerized resist is an extremely highly crosslinked polymer showing outstanding chemical and physical robustness with residual surface epoxy groups amenable for chemical functionalization. In this paper we describe, for the first time, the preparation and surface modification of SU-8 particles shaped as microbars, the attachment of appropriate linkers, and the successful application of these particles to multistep solid-phase synthesis leading to oligonucleotides and peptides attached in an unambiguous manner to the support surface.

AB - SU-8 is an epoxy-novolac resin and a well-established negative photoresist for microfabrication and microengineering. The photopolymerized resist is an extremely highly crosslinked polymer showing outstanding chemical and physical robustness with residual surface epoxy groups amenable for chemical functionalization. In this paper we describe, for the first time, the preparation and surface modification of SU-8 particles shaped as microbars, the attachment of appropriate linkers, and the successful application of these particles to multistep solid-phase synthesis leading to oligonucleotides and peptides attached in an unambiguous manner to the support surface.

KW - HIGH-ASPECT-RATIO

KW - PEPTIDE-SYNTHESIS

KW - CAPILLARY-ELECTROPHORESIS

KW - PROTEASE INHIBITORS

KW - MASS-SPECTROMETRY

KW - ARCHIP EPOXY

KW - PHOTORESIST

KW - OLIGONUCLEOTIDES

KW - IMMOBILIZATION

KW - MEMS

U2 - 10.1021/cc060079p

DO - 10.1021/cc060079p

M3 - Article

SN - 1520-4766

VL - 9

SP - 462

EP - 472

JO - Journal of combinatorial chemistry

JF - Journal of combinatorial chemistry

IS - 3

ER -

Multistep synthesis on SU-8: Combining microfabrication and solid-phase chemistry on a single material

Abstract

Keywords / Materials (for Non-textual outputs)

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Projects

Basic Technology - 4 billion bases a day - practical individual genome sequencing

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