Nanolithography using optical contact exposure in the evanescent near field

R. J. Blaikie, M. M. Alkaisi, S. J. McNab, D. R. S. Cumming, Rebecca Cheung

Research output: Contribution to journalArticlepeer-review

Original languageUndefined/Unknown
Pages (from-to)85-88
Number of pages4
JournalMicroelectronic Engineering
Volume46
Publication statusPublished - 1999

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