On-mask mismatch resistor structures for the characterisation of maskmaking capability

S. Smith; Andreas Tsiamis; A. McCallum; A. C. Hourd; Tom Stevenson; A. J. Walton; S. Enderling

On-mask mismatch resistor structures for the characterisation of maskmaking capability

S. Smith, Andreas Tsiamis, A. McCallum, A. C. Hourd, Tom Stevenson, A. J. Walton, S. Enderling

School of Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract / Description of output

This paper presents results from the use of electrical measurements to investigate dimensional mismatch in an advanced photomask process. Test structures consisting of matched pairs of Kelvin resistors have been measured and the results analysed to obtain information about the capability of the mask making process. The mask plate used in this work has an array of over 350 sets of mismatch test structures, providing an unprecedented volume of data. A second mask, which was underexposed, has allowed the relationship between mismatch and the location of nearby mask writing pattern boundaries to be investigated for the first time.

Original language	English
Title of host publication	2008 IEEE INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, CONFERENCE PROCEEDINGS
Place of Publication	NEW YORK
Publisher	Institute of Electrical and Electronics Engineers
Pages	228-232
Number of pages	5
ISBN (Print)	978-1-4244-1800-8
Publication status	Published - 2008
Event	IEEE International Conference on Microelectronic Test Structures - Edinburgh Duration: 24 Mar 2008 → 27 Mar 2008

Conference

Conference	IEEE International Conference on Microelectronic Test Structures
City	Edinburgh
Period	24/03/08 → 27/03/08

IEEE International Conference on Microelectronic Test Structures
Stewart Smith (Chair)
24 Mar 2008 → 27 Mar 2008
Activity: Participating in or organising an event types › Participation in conference

Cite this

@inproceedings{fcbafc9338d74f828ec32e0caac3cc8a,

title = "On-mask mismatch resistor structures for the characterisation of maskmaking capability",

abstract = "This paper presents results from the use of electrical measurements to investigate dimensional mismatch in an advanced photomask process. Test structures consisting of matched pairs of Kelvin resistors have been measured and the results analysed to obtain information about the capability of the mask making process. The mask plate used in this work has an array of over 350 sets of mismatch test structures, providing an unprecedented volume of data. A second mask, which was underexposed, has allowed the relationship between mismatch and the location of nearby mask writing pattern boundaries to be investigated for the first time.",

author = "S. Smith and Andreas Tsiamis and A. McCallum and Hourd, {A. C.} and Tom Stevenson and Walton, {A. J.} and S. Enderling",

year = "2008",

language = "English",

isbn = "978-1-4244-1800-8",

pages = "228--232",

booktitle = "2008 IEEE INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, CONFERENCE PROCEEDINGS",

publisher = "Institute of Electrical and Electronics Engineers",

address = "United States",

note = "IEEE International Conference on Microelectronic Test Structures ; Conference date: 24-03-2008 Through 27-03-2008",

}

Smith, S , Tsiamis, A, McCallum, A, Hourd, AC, Stevenson, T, Walton, AJ & Enderling, S 2008, On-mask mismatch resistor structures for the characterisation of maskmaking capability. in 2008 IEEE INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, CONFERENCE PROCEEDINGS. Institute of Electrical and Electronics Engineers, NEW YORK, pp. 228-232, IEEE International Conference on Microelectronic Test Structures, Edinburgh, 24/03/08.

On-mask mismatch resistor structures for the characterisation of maskmaking capability. / Smith, S.; Tsiamis, Andreas; McCallum, A. et al.
2008 IEEE INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, CONFERENCE PROCEEDINGS. NEW YORK: Institute of Electrical and Electronics Engineers, 2008. p. 228-232.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - On-mask mismatch resistor structures for the characterisation of maskmaking capability

AU - Smith, S.

AU - Tsiamis, Andreas

AU - McCallum, A.

AU - Hourd, A. C.

AU - Stevenson, Tom

AU - Walton, A. J.

AU - Enderling, S.

PY - 2008

Y1 - 2008

N2 - This paper presents results from the use of electrical measurements to investigate dimensional mismatch in an advanced photomask process. Test structures consisting of matched pairs of Kelvin resistors have been measured and the results analysed to obtain information about the capability of the mask making process. The mask plate used in this work has an array of over 350 sets of mismatch test structures, providing an unprecedented volume of data. A second mask, which was underexposed, has allowed the relationship between mismatch and the location of nearby mask writing pattern boundaries to be investigated for the first time.

AB - This paper presents results from the use of electrical measurements to investigate dimensional mismatch in an advanced photomask process. Test structures consisting of matched pairs of Kelvin resistors have been measured and the results analysed to obtain information about the capability of the mask making process. The mask plate used in this work has an array of over 350 sets of mismatch test structures, providing an unprecedented volume of data. A second mask, which was underexposed, has allowed the relationship between mismatch and the location of nearby mask writing pattern boundaries to be investigated for the first time.

M3 - Conference contribution

SN - 978-1-4244-1800-8

SP - 228

EP - 232

BT - 2008 IEEE INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, CONFERENCE PROCEEDINGS

PB - Institute of Electrical and Electronics Engineers

CY - NEW YORK

T2 - IEEE International Conference on Microelectronic Test Structures

Y2 - 24 March 2008 through 27 March 2008

ER -

On-mask mismatch resistor structures for the characterisation of maskmaking capability

Abstract / Description of output

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IEEE International Conference on Microelectronic Test Structures

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