On-mask mismatch resistor structures for the characterisation of maskmaking capability

S. Smith, Andreas Tsiamis, A. McCallum, A. C. Hourd, Tom Stevenson, A. J. Walton, S. Enderling

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This paper presents results from the use of electrical measurements to investigate dimensional mismatch in an advanced photomask process. Test structures consisting of matched pairs of Kelvin resistors have been measured and the results analysed to obtain information about the capability of the mask making process. The mask plate used in this work has an array of over 350 sets of mismatch test structures, providing an unprecedented volume of data. A second mask, which was underexposed, has allowed the relationship between mismatch and the location of nearby mask writing pattern boundaries to be investigated for the first time.

Original languageEnglish
Title of host publication2008 IEEE INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, CONFERENCE PROCEEDINGS
Place of PublicationNEW YORK
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
Pages228-232
Number of pages5
ISBN (Print)978-1-4244-1800-8
Publication statusPublished - 2008
EventIEEE International Conference on Microelectronic Test Structures - Edinburgh
Duration: 24 Mar 200827 Mar 2008

Conference

ConferenceIEEE International Conference on Microelectronic Test Structures
CityEdinburgh
Period24/03/0827/03/08

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