Passivation of donors in electron-beam lithographically defined nanostructures after methane/hydrogen reactive ion etching

Rebecca Cheung, S. Thoms, I. McIntyre, C. D. W. Wilkinson, S. P. Beaumont

Research output: Contribution to journal › Article › peer-review

Original language	Undefined/Unknown
Pages (from-to)	1911-1914
Number of pages	4
Journal	Journal of Vacuum Science and Technology B
Volume	B6
Publication status	Published - 1988

Cite this

@article{c5c24f96e3404d958f1b7152420dc9cc,

title = "Passivation of donors in electron-beam lithographically defined nanostructures after methane/hydrogen reactive ion etching",

author = "Rebecca Cheung and S. Thoms and I. McIntyre and Wilkinson, {C. D. W.} and Beaumont, {S. P.}",

year = "1988",

language = "Undefined/Unknown",

volume = "B6",

pages = "1911--1914",

journal = "Journal of Vacuum Science and Technology B",

issn = "1520-8567",

publisher = "A V S AMER INST PHYSICS",

}

TY - JOUR

T1 - Passivation of donors in electron-beam lithographically defined nanostructures after methane/hydrogen reactive ion etching

AU - Cheung, Rebecca

AU - Thoms, S.

AU - McIntyre, I.

AU - Wilkinson, C. D. W.

AU - Beaumont, S. P.

PY - 1988

Y1 - 1988

M3 - Article

SN - 1520-8567

SN - 2166-2754

VL - B6

SP - 1911

EP - 1914

JO - Journal of Vacuum Science and Technology B

JF - Journal of Vacuum Science and Technology B

ER -