Patterning of 70nm features on 140nm period using evanescent near-field optical lithography (ENFOL)

M. M. Alkaisi, R. J. Blaikie, S. J. McNab, Rebecca Cheung, D. R. S. Cumming

Research output: Contribution to journalArticlepeer-review

Original languageUndefined/Unknown
Pages (from-to)3560-3562
Number of pages3
JournalApplied Physics Letters
Volume75
Publication statusPublished - 1999

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