| Original language | Undefined/Unknown |
|---|---|
| Pages (from-to) | 3560-3562 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 75 |
| Publication status | Published - 1999 |
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Patterning of 70nm features on 140nm period using evanescent near-field optical lithography (ENFOL)
- M. M. Alkaisi
- , R. J. Blaikie
- , S. J. McNab
- , Rebecca Cheung
- , D. R. S. Cumming
Research output: Contribution to journal › Article › peer-review