| Original language | Undefined/Unknown |
|---|---|
| Pages (from-to) | 1189-1198 |
| Number of pages | 10 |
| Journal | Semiconductor science and technology |
| Volume | 7 |
| Publication status | Published - 1992 |
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Reactive ion etching induced damage in GaAs and AlGaAs using SiCl4
Research output: Contribution to journal › Article › peer-review