Reactive ion etching of GaAs using a mixture of methane and hydrogen

Rebecca Cheung, S. Thoms, S. P. Beaumont, G. Doughty, V. Law, C. D. W. Wilkinson

Research output: Contribution to journalArticlepeer-review

Original languageUndefined/Unknown
Pages (from-to)857-859
Number of pages3
JournalElectronics Letters
Volume23
Publication statusPublished - 1987

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