Reactive Ion Etching (RIE) of Zinc Oxide (ZnO) in SiCl4 based plasmas

E. Mastropaolo, A. M. Gundlach, C. Fragkiadakis, P. B. Kirby, Rebecca Cheung

Research output: Contribution to journal › Article › peer-review

Cite this

@article{b55e6eb41dfa43b9a8924c947b38d4a4,

title = "Reactive Ion Etching (RIE) of Zinc Oxide (ZnO) in SiCl4 based plasmas",

author = "E. Mastropaolo and Gundlach, {A. M.} and C. Fragkiadakis and Kirby, {P. B.} and Rebecca Cheung",

year = "2007",

language = "Undefined/Unknown",

volume = "43",

pages = "1467--1469",

journal = "Electronics Letters",

issn = "0013-5194",

publisher = "Institution of Engineering and Technology",

number = "25",

}