| Original language | Undefined/Unknown |
|---|---|
| Pages (from-to) | 1467-1469 |
| Number of pages | 3 |
| Journal | Electronics Letters |
| Volume | 43 |
| Issue number | 25 |
| Publication status | Published - 2007 |
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Reactive Ion Etching (RIE) of Zinc Oxide (ZnO) in SiCl4 based plasmas
- E. Mastropaolo
- , A. M. Gundlach
- , C. Fragkiadakis
- , P. B. Kirby
- , Rebecca Cheung
Research output: Contribution to journal › Article › peer-review