Relaxation of process-induced surface stress in amorphous silicon carbide thin films using low energy ion bombardment

P. Argyrakis, A. J. Snell, Rebecca Cheung

Research output: Contribution to journalArticlepeer-review

Original languageUndefined/Unknown
Pages (from-to)034101-1-3
JournalApplied Physics Letters
Volume89
Publication statusPublished - 2006

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