SIMS depth profiling and SRIM simulation to lower energy antimony implantation into silicon

Y. P. Li, J. Shyue, J. Hunter, B. McComb, M. Chun, Ruth Doherty, A. Foad, B. Brown (Editor), T. L. Alford (Editor), M. Nastasi (Editor), M. C. Vella (Editor)

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)625-628
Number of pages4
JournalIit2002: ion implantation technology, proceedings
Publication statusPublished - 2003

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