Sub-diffraction-limited patterning using evanescent near field optical lithography

M. M. Alkaisi, R. J. Blaikie, S. J. McNab, R. Cheung, D. R. S. Cumming

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageUndefined/Unknown
Title of host publicationTechnical Digest of MAIR/OITDA Workshop on Ultrahigh Density Optical Storage and Related Techniques
Publication statusPublished - 2000

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