Sub-diffraction-limited patterning using evanescent near field optical lithography

M. M. Alkaisi, R. J. Blaikie, S. J. McNab, R. Cheung, D. R. S. Cumming

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	Undefined/Unknown
Title of host publication	Technical Digest of MAIR/OITDA Workshop on Ultrahigh Density Optical Storage and Related Techniques
Publication status	Published - 2000

Cite this

@inproceedings{85da9ac911d04e09b4513e39fefce27c,

title = "Sub-diffraction-limited patterning using evanescent near field optical lithography",

author = "Alkaisi, {M. M.} and Blaikie, {R. J.} and McNab, {S. J.} and R. Cheung and Cumming, {D. R. S.}",

year = "2000",

language = "Undefined/Unknown",

booktitle = "Technical Digest of MAIR/OITDA Workshop on Ultrahigh Density Optical Storage and Related Techniques",

}