Surface characterisation of inductively coupled plasma etched SiC in SF6/O2

L. Jiang, N. O. V. Plank, Rebecca Cheung

Research output: Contribution to journalArticlepeer-review

Original languageUndefined/Unknown
Pages (from-to)369-375
Number of pages7
JournalMicroelectronic Engineering
Volume67-68
Publication statusPublished - 2003

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