Surface plasmon resonance for digital imaging

David R.S. Cumming*, Qin Chen, Kirsty Walls, Timothy D. Drysdale, Stephen Collins, Dipayan Das, Danial Chitnis

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We present the design, implementation and test of a CMOS image sensor filter technology based on the exploitation of surface plasmon resonance. We demonstrate precise design and control of the spectral response of filters made in a single aluminium film. The film is patterned using electron beam lithography and reactive ion etching. Unlike conventional filter technology for CMOS, all the desired colour responses can be obtained in a single lithographic sequence. We show that the photocurrent from the sensors has the required spectral response after fabrication.

Original languageEnglish
Title of host publication2012 12th IEEE International Conference on Nanotechnology, NANO 2012
DOIs
Publication statusPublished - 22 Nov 2012
Event2012 12th IEEE International Conference on Nanotechnology, NANO 2012 - Birmingham, United Kingdom
Duration: 20 Aug 201223 Aug 2012

Publication series

NameProceedings of the IEEE Conference on Nanotechnology
ISSN (Print)1944-9399
ISSN (Electronic)1944-9380

Conference

Conference2012 12th IEEE International Conference on Nanotechnology, NANO 2012
Country/TerritoryUnited Kingdom
CityBirmingham
Period20/08/1223/08/12

Keywords

  • Digital imaging
  • Lithography
  • Plasmonics

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