The dynamics and etching patterns in reactive ion etching of silicon for future chip designs

L. S. Pilliing, R. Cheung, R. Ruennemeyer

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageUndefined/Unknown
Title of host publicationProceedings of 6th Electronics New Zealand Conference (ENZCon99)
Pages5
Number of pages1
Publication statusPublished - 1999

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