X-ray photoelectron spectroscopy studies of the effects of plasma etching on amorphous carbon nitride films

L. Jiang, A. G. Fitzgerald, M. J. Rose, Rebecca Cheung, B. Rong, E. van der Drift

Research output: Contribution to journalArticlepeer-review

Original languageUndefined/Unknown
Pages (from-to)144-148
Number of pages5
JournalApplied Surface Science
Volume193
Publication statusPublished - 2002

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