XPS study on dry etching of $ Si/Ge sub x Si sub 1-x $

Research output: Contribution to journal › Article › peer-review

Original language	Undefined/Unknown
Pages (from-to)	481-485
Number of pages	5
Journal	Microelectronic Engineering
Volume	27
Publication status	Published - 1995

Cite this

@article{7944a49a732b4f2daa7279885338a73f,

title = "XPS study on dry etching of \$ Si/Ge sub x Si sub 1-x \$",

author = "Drift, \{E. van der\} and T. Zijlstra and E. Fakkeldij and Rebecca Cheung and K. Werner and S. Radelaar",

year = "1995",

language = "Undefined/Unknown",

volume = "27",

pages = "481--485",

journal = "Microelectronic Engineering",

publisher = "Elsevier",

}