Edinburgh Research Explorer

Approaching the Intrinsic Limit in Transition Metal Diselenides via Point Defect Control

Research output: Contribution to journalArticle

  • Drew Edelberg
  • Daniel Rhodes
  • Alexander Kerelsky
  • Bumho Kim
  • Jue Wang
  • Amirali Zangiabadi
  • Chanul Kim
  • Antony Abhinandan
  • Jenny Ardelean
  • Declan Scullion
  • Lior Embon
  • Rui Zu
  • Elton Santos
  • Luis Balicas
  • Chris Marianetti
  • Katayun Barmak
  • Xiaoyang Zhu
  • James Hone
  • Abhay N. Pasupathy

Related Edinburgh Organisations

Original languageEnglish
JournalNano Letters
Publication statusPublished - 5 Jun 2019


Two dimensional (2D) transition-metal dichalcogenide (TMD) based semiconductors have generated intense recent interest due to their novel optical and electronic properties, and potential for applications. In this work, we characterize the atomic and electronic nature of intrinsic point defects found in single crystals of these materials synthesized by two different methods - chemical vapor transport and self-flux growth. Using a combination of scanning tunneling microscopy (STM) and scanning transmission electron microscopy (STEM), we show that the two major intrinsic defects in these materials are metal vacancies and chalcogen antisites. We show that by control of the synthetic conditions, we can reduce the defect concentration from above 1013 /cm2 to below 1011 /cm2. Because these point defects act as centers for non-radiative recombination of excitons, this improvement in material quality leads to a hundred-fold increase in the radiative recombination efficiency.

ID: 159081613